SciSil high-purity silica gel contains less than 5 ppm metal impurities. Its surface bonding and coverage technology allows it to achieve good peak symmetry while maintaining strong resistance to highly basic mobile phases.
Traditional silica synthesis cannot remove a large amount of metal impurities. As a result, when analyzing basic compounds or compounds prone to chelation, significant tailing occurs, and samples may be adsorbed by the stationary phase. SciSil uses Type B silica gel, prepared from Si(OC2H5)4, which contains virtually no metal impurities. Therefore, it is recommended to choose Type B silica gel columns when selecting chromatography columns.
SciSil employs a special surface coverage technology, where C18 bonded phases are interconnected on the silica surface. This ensures extended column lifetime even under strong acidic or basic mobile phase conditions.
• High-purity silica gel, metal impurities <5 ppm
• Wide pH range, fully compatible with pH 1.5–10.5
• Consistent reproducibility across different batches
• Long service life
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